Selective chemical vapor deposition of copper using (hfac) copper(I) vinyltrimethylsilane in the absence and presence of water - Concepedia

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Selective chemical vapor deposition of copper using (hfac) copper(I) vinyltrimethylsilane in the absence and presence of water

36

Citations

18

References

1995

Year

Ajay K. Jain, A. V. Gelatos, Toivo T. Kodas, Mark J. Hampden‐Smith, Richard J. Marsh, C. J. Mogab

Thin Solid Films

Materials ScienceChemical EngineeringEngineeringSurface ScienceChemistryChemical DepositionChemical Vapor Deposition

References

	Year	Citations

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