Journal of Applied Physics · 1996 · 20 citations · 8 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsSurface ScienceChemical Vapor DepositionDielectricsElectrical CharacterizationSemiconductor InterfacesSemiconductor SurfacesSurface ChargeSpectroscopic Surface AnalysisSurface Charge CharacterizationSurface Charge MeasurementSurface Charge PropertiesSurface ChargingSurface PotentialSurface Potential AnalysisSurface Potential Measurement
In the present study, a modified charge neutralizer was used to generate both the negative and positive surface potentials at the dielectric surface for the surface charge spectroscopy (SCS). A stable surface potential and a uniform potential area can be easily achieved. The SCS results of plasma enhanced chemical vapor deposition SiO2/Si samples without annealing and thermal SiO2/Si samples with and without annealing in forming gas (4%H2 in N2) are used to demonstrate the applicability of the SCS analysis.
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