Publication | Closed Access
Atomic-scale roughness of GaAs/AlAs interfaces: A Raman scattering study of asymmetrical short-period superlattices
71
Citations
10
References
1990
Year
Materials ScienceAluminium NitrideIi-vi SemiconductorEngineeringPhysicsOptical PropertiesCondensed Matter PhysicsApplied PhysicsGaas/alas InterfacesShort PeriodSemiconductor NanostructuresPhononAsymmetrical Short-period SuperlatticesAtomic-scale RoughnessMolecular Beam EpitaxyDifferent Gaas WellsGaas/alas Superlattices
We present Raman spectra obtained from very short period (a few atomic layers) GaAs/AlAs superlattices with asymmetrical unit cells containing two different GaAs wells. This allows us to analyze quantitatively for the first time the atomic-scale component of the interface roughness. We demonstrate that it mainly originates at the GaAs on AlAs interface and strongly decreases with the growth temperature and the underlying AlAs layer thickness.
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