Construction of a Soft X-Ray Emission Spectroscopy (SXES) Apparatus and Its Application for Study of Electronic and Atomic Structures of a Multilayer System

Motohiro Iwami, Masaaki Hirai, M. Kusaka, Masaru Kubota, Sekika Yamamoto, Hatsuo Nakamura, H. Watabe, Masao Kawai, Hiroyoshi Soezima

Japanese Journal of Applied Physics · 1990 · 44 citations · 6 references

Concepts

Abstract

A soft X-ray emission spectroscopy (SXES) apparatus was constructed using a grating monochromator. The resolution was sufficient to show differences in valence electronic structures of Si compounds including pure Si crystal. A nondestructive analysis of a Ni/Si(111) specimen with heat treatment was carried out using either a clear difference in Si L 2,3 SXES spectra of Ni silicide and Si single crystals or the fact that the soft X-ray production depth increases in a solid with increasing energy of a primary electron, E p . The electronic and atomic structures of the surface and interface of specimens adopted were clarified with E p varying between 1.5 and 10 keV.

References

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