Tin, Tic and Ti(C, N) film characterization and its relationship to tribological behaviour

Abstract

Abstract Scanning electron microscopy observations, energy dispersive spectroscopy, x‐ray diffraction and x‐ray photoelectron spectroscopy analyses have been employed to study the composition and the microstructure of titanium carbonitride coatings deposited by a reactive ion‐plating industrial system. Both TiN and Ti(C, N) coatings show a very fine and dense microstructure and consist of a NaCl‐type single phase with a marked preferred orientation. X‐ray photoelectron spectroscopy analysis of the characteristic Ti, C and N lines establishes the extent of Ti(C, N) compound formation and the dependence of composition on the reactive gas flow ratio. Depth profiles obtained by XPS analyses after cycles of Ar + sputtering indicate chemical uniformity of the films. Microhardness measurements taken on coated HSS specimens show that Ti(C, N) are significantly harder than TiN and TiC films deposited under the same conditions. Ti(C, N) coatings have a lower coefficient of friction and a higher wear resistance than TiN coatings, irrespective of the mating material.