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ZnTe nanowires grown on GaAs(100) substrates by molecular beam epitaxy
75
Citations
24
References
2006
Year
EngineeringNanowire GrowthMetallic NanomaterialsZnte NanowiresSemiconductor NanostructuresIi-vi SemiconductorNanostructure SynthesisMolecular Beam EpitaxyNanoscale ScienceCompound SemiconductorMaterials ScienceNanoscale SystemNanotechnologyNanomanufacturingNanostructuringElectronic MaterialsNanomaterialsApplied PhysicsSubstrate SurfaceNanofabricationNanostructures
ZnTe nanowires with an average diameter of about 30nm and lengths above 1μm were grown on GaAs(100) substrate by molecular beam epitaxy. The growth process was based on the Au-catalyzed vapor-liquid-solid mechanism. A thin gold layer (3–20Å thick) annealed in high vacuum prior to the nanowire growth was used as a source of catalytic nanoparticles. The nanowires are inclined about 55° to the (100) substrate surface normal. They have a zinc-blende crystal structure and their growth axis is ⟨111⟩.
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