Effect of a thin W, Pt, Mo, and Zr interlayer on the thermal stability and electrical characteristics of NiSi

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J. Gambino, E. G. Colgan · Materials Chemistry and Physics · 1998 · 389 citations

Natural Sciences, Materials Science, Physics +7

Metal Silicides in CMOS Technology: Past, Present, and Future Trends

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Engineering, Electrical Engineering, Materials Science +17

Thermal stability study of NiSi and NiSi2 thin films

Feng Zhao, Jingjing Zheng, Zexiang Shen et al. · Microelectronic Engineering · 2003 · 108 citations

Natural Sciences, Materials Engineering, Materials Science +14

New salicidation technology with Ni(Pt) alloy for MOSFETs

Pooi See Lee, K. L. Pey, D. Mangelinck et al. · IEEE Electron Device Letters · 2001 · 94 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Improved NiSi salicide process using presilicide N/sub 2//sup +/ implant for MOSFETs

Pooi See Lee, K. L. Pey, D. Mangelinck et al. · IEEE Electron Device Letters · 2000 · 33 citations · Full text

Engineering, Electrical Engineering, Materials Science +17