Publication | Closed Access
Effects of current density and deposition time on electrical resistivity of electroplated Cu layers
48
Citations
13
References
2004
Year
Materials ScienceMaterials EngineeringElectrical EngineeringDeposition TimeEngineeringSpecific ResistanceElectromigration TechniqueCorrosionCurrent DensitySurface ScienceApplied PhysicsElectronic PackagingChemical DepositionMicroelectronicsElectrical PropertyElectrical ResistivityInterconnect (Integrated Circuits)Electrical Insulation
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|---|---|---|
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