Electrochemical and Solid-State Letters · 1999 · 36 citations · 0 references
Natural SciencesMaterials EngineeringMaterials ScienceSurface ChemistrySurface ScienceThin FilmsPlasma Surface TreatmentPlasma-surface InteractionsSurface ModificationSurface PhysicsSurface TreatmentThin Film Optical PropertiesFilm ThicknessPorous SilicaPorous Silica MaterialsSurface Chemistry Of Silica
Porous silica film with a median pore size of was exposed to an oxygen plasma afterglow. The exposure resulted in a removal of hydrophobic organic groups from the silica surface, leading to a continuous increase in the refractive index and a decrease in film thickness. The exposure to the thermal oxide did not produce any change in the film. ©1998 The Electrochemical Society