Physical Review Letters · 1994 · 769 citations · 11 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials ChemistryPhysical ChemistrySpectroscopyAuger Electron SpectroscopyInorganic SpectroscopyPhotoelectron SpectroscopyX-ray Photoelectron SpectroscopyC:n:p StoichiometryCompositionNitride Thin FilmsNitrides DepositionNitrides Thin FilmsNitrogen Content Analysis
Carbon nitride films deposited by three different methods have been analyzed using in situ Auger electron spectroscopy and ex situ x-ray photoelectron spectroscopy (XPS) and Rutherford backscattering spectrometry. The XPS data for all 27 samples indicate that these films have a similar composition consisting of two phases. One phase has a stoichiometry near ${\mathrm{C}}_{3}$${\mathrm{N}}_{4}$ and is identified as a tetrahedral component. The other phase has a variable stoichiometry from ${\mathrm{C}}_{5}$N to ${\mathrm{C}}_{2}$N and is identified as predominantly an $s{p}^{2}$ bonded structure. For a film composition of [N]/[C] 1, the tetrahedrally bonded component grows only moderately as the nitrogen content of the films is increased.
11
Molecular Spectroscopy by Means of ESCA III.<i>Carbon compounds</i>
U. Gelius, Per Filip Hedén, J. Hedman et al. · Physica Scripta · 1970 · 603 citations
Natural Sciences, Chemistry, Physics +17