Real-time study of oxygen reaction on Si(100)

Abstract

The reaction of oxygen on Si(100) surfaces from 700 to 950\ifmmode^\circ\else\textdegree\fi{}C has been studied in real time with about 10-\ensuremath{\mu}s resolution, by use of pulsed molecular-beam reactive scattering. The oxygen reaction probability is roughly proportional to the normal component of the incident ve- locity of the ${\mathrm{O}}_{2}$ molecule. An intermediate step between the initial adsorption of oxygen and the desorption of SiO was observed.