Publication | Closed Access
Low-pressure MOCVD growth of p-type ZnO thin films by using NO as the dopant source
108
Citations
13
References
2004
Year
Materials ScienceLow-pressure Mocvd GrowthMaterials EngineeringDopant SourceEngineeringOxide ElectronicsApplied PhysicsGallium OxideThin FilmsChemical Vapor DepositionThin Film Processing
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