Applied Physics Letters · 2005 · 13 citations · 12 references
Natural SciencesMaterials SciencePhysicsRadiation MeasurementRadiation PhysicsSurface ScienceHeavy-ion PhysicsHighly Charged IonsSurface PhysicsCoulomb ExplosionIon-surface InteractionsProjectile TechnologyRadiation-induced Surface EffectsSputteringSputtering EffectsSputtering ProcessesSurface Sputtering
The emission of sputtered ions from a hydrogen-terminated Si(111) 1×1 surface has been measured for impact of slow (v<0.25vBohr) highly charged Xe ions. Proton sputtering yields increase strongly with projectile charge q (qγ;γ∼4) and reach to the value greater than one for Xeq+ impact (q≧44). Yields of Si+ remain constant (∼0.1) for lower q (14≦q≦29) but increase with q for higher q region which shows that the apparent Coulomb explosion-like potential sputtering might set in and enhances the sputtering yield drastically over q=29.
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Interaction of slow multicharged ions with solid surfaces
A. Arnau, F. Aumayr, P. M. Échenique et al. · Surface Science Reports · 1997 · 362 citations
Natural Sciences, Chemistry, Physics +12
Interaction of slow, very highly charged ions with surfaces
T. Schenkel, A. V. Hamza, A. V. Barnes et al. · Progress in Surface Science · 1999 · 218 citations
Natural Sciences, Chemistry, Physics +10
A New Versatile Electron-Beam Ion Trap
F. J. Currell, J Asada, Koichi Ishii et al. · Journal of the Physical Society of Japan · 1996 · 112 citations