S2 F10 Formation in Computer Simulation Studies of the Breakdown of SF6

John Herron

IEEE Transactions on Electrical Insulation · 1987 · 19 citations · 5 references

Concepts

Abstract

The chemistry subsequent to the dielectric breakdown of SF6 under "mild" conditions has been modeled on the basis of known or estimated chemical kinetic data for the neutral reactive species postulated to be formed in the breakdown process. The emphasis is on the significance of S2FlO as an end product of dielectric breakdown and on the role of water vapor in S2F10 formation.

References

5