Journal of Applied Physics · 1983 · 46 citations · 21 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials ChemistryOptical MaterialsOpticsEpitaxial GrowthOptical CeramicsOptical Properties Of SolidsOptical Thin FilmsOxide SemiconductorsThin Film Optical PropertiesAnnealingAnnealing Temperature EffectsOxide CeramicsOxide Growth KineticsPlanar Optical WaveguidesTitanium OxidesWaveguide Materials
TiO2, LiNb3O8, and (Ti0.65Nb0.35)O2 compounds have been observed and characterized during the fabrication of optical waveguides by Ti indiffusion in LiNbO3, performed in a flowing dry O2 atmosphere. Ti oxidizes by reacting with both O atoms of the surrounding atmosphere and of the LiNbO3 substrate. TiO2 formation is followed by LiNb3O8 and (Ti0.65Nb0.35)O2 phase growth. With further increasing in the annealing temperature the TiO2 and LiNb3O8 compounds are consumed and vanish. After 30 min at 950 °C both Y- and Z-cut substrates appear covered only by a uniform and epitaxial (Ti0.65Nb0.35)O2 layer which behaves as the real source for Ti diffusion. The LiNb3O8 formation and dissolution were also observed in samples uncoated with Ti. Similar results were observed in LiNbO3 samples annealed in dry N, Ar, and static air.
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Guided-wave devices for optical communication
R. C. Alferness · IEEE Journal of Quantum Electronics · 1981 · 273 citations
Ti diffusion in Ti : LiNbO3 planar and channel optical waveguides
W. K. Burns, P. Klein, E. J. West et al. · Journal of Applied Physics · 1979 · 152 citations
Natural Sciences, Materials Engineering, Materials Science +15