Publication | Closed Access
Interface Roughness Scattering and Electron Mobilities in Thin GaAs Quantum Wells
122
Citations
15
References
1988
Year
SemiconductorsSemiconductor TechnologyCategoryquantum ElectronicsLow TemperaturesEngineeringPhysicsApplied PhysicsQuantum MaterialsCondensed Matter PhysicsRoughness ParametersElectron MobilitiesInterface Roughness ScatteringInterface RoughnessSemiconductor DeviceSemiconductor Nanostructures
The mobility of the two-dimensional electron gas in thin GaAs multiple quantum well structures is studied. At low temperatures a strong decrease is found for well widths between 60 Å and 40 Å. This can be explained by interface roughness scattering. The measured electron density dependence of the mobility is used to determine the roughness parameters Λ ≈ 65 Å an Δ' ≈ 2.4 Å. The importance of the penetration of the electron wave function into the barrier is discussed.
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