Concepedia

Comparison of C<sub>2</sub>F<sub>6</sub> and FASi-4 as fluorine dopant sources in plasma enhanced chemical vapor deposited fluorinated silica glass films

Woo Sik Yoo, Richard Swope, Barbara Sparks, David Mordo

Journal of materials research/Pratt's guide to venture capital sources · 1997 · 18 citations · 4 references

DOI

Concepts

References

4

Low Dielectric Constant Interlayer Using Fluorine-Doped Silicon Oxide

Takashi Usami, Kimiaki Shimokawa, Masaki Yoshimaru · Japanese Journal of Applied Physics · 1994 · 125 citations

, , +17

CVD of fluorosilicate glass for ULSI applications

M. J. Shapiro, S. Nguyen, T. Matsuda et al. · Thin Solid Films · 1995 · 67 citations

, , +4

Study of the material properties and suitability of plasma-deposited fluorine-doped silicon dioxides for low dielectric constant interlevel dielectrics

V. L. Shannon, Marwa Karim · Thin Solid Films · 1995 · 40 citations

, , +16

Intermetal Dielectric Gap Fill by Plasma Enhanced Chemical Vapor Deposited Fluorine-Doped Silicon Dioxide Films

Woo Sik Yoo, Richard Swope · Japanese Journal of Applied Physics · 1996 · 11 citations

, , +14