Nitrogen flow rate dependence of the growth morphology of TiAlN films deposited by reactive sputtering

Titanium aluminum nitride films: A new alternative to TiN coatings

Wolf‐Dieter Münz · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 947 citations

Natural Sciences, Materials Engineering, Materials Science +17

Superhard nanocomposite Ti1−Al N films prepared by magnetron sputtering

J. Musil, H. Hrubý · Thin Solid Films · 2000 · 256 citations

Natural Sciences, Materials Engineering, Materials Science +11

Anti-oxidation properties of TiAlN film prepared by plasma-assisted chemical vapor deposition and roles of Al

Chung Wan Kim, Kwang Ho Kim · Thin Solid Films · 1997 · 157 citations

Natural Sciences, Materials Engineering, Materials Science +16

A model for development of orientation of vapour deposits

Dong Nyung Lee · Journal of Materials Science · 1989 · 117 citations

Natural Sciences, Earth Sciences, Petroleum Engineering +9

Morphology of thin silver film grown by dc sputtering on Si(001)

Sourav Kundu, S. Hazra, S. Banerjee et al. · Journal of Physics D Applied Physics · 1998 · 90 citations

Natural Sciences, Materials Engineering, Materials Science +15