Journal of Applied Physics · 2014 · 40 citations · 39 references
EngineeringCrystal Growth TechnologyThermoelectricsEb IrradiationFerroelectric ApplicationNanoelectronicsHomogeneous IrradiationThin Film ProcessingMaterials ScienceMaterials EngineeringElectrical EngineeringNanotechnologySemiconductor MaterialPyroelectricityElectrical PropertyElectron BeamApplied PhysicsHomogenous Electron BeamThermoelectric MaterialThin Films
The effects of homogenous electron beam (EB) irradiation on the crystal growth and thermoelectric properties of n-type Bi-Se-Te and p-type Bi-Sb-Te thin films were investigated. Both types of thin films were prepared by flash evaporation, after which homogeneous EB irradiation was performed at an acceleration voltage of 0.17 MeV. For the n-type thin films, nanodots with a diameter of less than 10 nm were observed on the surface of rice-like nanostructures, and crystallization and crystal orientation were improved by EB irradiation. The resulting enhancement of mobility led to increased electrical conductivity and thermoelectric power factor for the n-type thin films. In contrast, the crystallization and crystal orientation of the p-type thin films were not influenced by EB irradiation. The carrier concentration increased and mobility decreased with increased EB irradiation dose, possibly because of the generation of defects. As a result, the thermoelectric power factor of p-type thin films was not improved by EB irradiation. The different crystallization behavior of the n-type and p-type thin films is attributed to atomic rearrangement during EB irradiation. Selenium in the n-type thin films is more likely to undergo atomic rearrangement than the other atoms present, so only the crystallinity of the n-type Bi-Se-Te thin films was enhanced.
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