Effect of input power on crystal orientation and residual stress in AlN film deposited by dc sputtering

Thermal expansion of AlN, sapphire, and silicon

Woosoon Yim, R. J. Paff · Journal of Applied Physics · 1974 · 584 citations

Natural Sciences, Materials Engineering, Materials Science +17

Zero-Temperature-Coefficient SAW Devices on AlN Epitaxial Films

K. Tsubouchi, Nobuo Mikoshiba · IEEE Transactions on Sonics and Ultrasonics · 1985 · 492 citations · Full text

Engineering, Electrical Engineering, Materials Science +15

Internal stresses in titanium, nickel, molybdenum, and tantalum films deposited by cylindrical magnetron sputtering

John A. Thornton, David W. Hoffman · Journal of Vacuum Science and Technology · 1977 · 298 citations

Natural Sciences, Materials Engineering, Materials Science +17

Low-temperature growth of piezoelectric AlN film by rf reactive planar magnetron sputtering

Tadashi Shiosaki, Tomoko Yamamoto, Tomoyuki Oda et al. · Applied Physics Letters · 1980 · 165 citations

Natural Sciences, Materials Engineering, Materials Science +15

The influence of discharge current on the intrinsic stress in Mo films deposited using cylindrical and planar magnetron sputtering sources

John A. Thornton, David W. Hoffman · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1985 · 154 citations

Natural Sciences, Materials Science, Physics +17