Properties of high resistivity CoPdAlO film for possibility of application to RF integrated inductor

Taek‐Soo Kim, K. Suezawa, Masahiro Yamaguchi, K.I. Arai, Yutaka Shimada, Chong-Oh Kim

IEEE Transactions on Magnetics · 2001 · 20 citations · 3 references

Concepts

Abstract

Presently, an inductor adapted at MMIC (Monolithic microwave integrated circuit) which is used for cellular phone or PHS operates at quasimicrowave range over 800 MHz. However, a W-CDMA (Wideband code division multiple access) will use about 2 GHz range. Therefore magnetic film devices should be compatible up to 2 GHz. We deposited Co-Pd-Al-O system film using rf sputtering method which is expected for operating at 2 GHz, and investigated the effect of Pd content and magnetic field annealing. When Pd composition is 19%, H/sub k/ was 118 Oe, and showed flat frequency characteristics until 1.5 GHz. The Q factor (=/spl mu/'//spl mu/") was 23.3 at 1 GHz, 6.7 at 1.5 GHz and 1.5 at 2 GHz, respectively. Resonance frequency was 2.9 GHz, therefore Co-Pd-Al-O thin film could be used at over 1 GHz, and also expected as an inductor material for next generation MMIC.

References

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