Publication | Closed Access
Mechanism for Cu void defect on various electroplated film conditions
19
Citations
11
References
2005
Year
Materials ScienceMaterials EngineeringElectrical EngineeringElectromigration TechniqueEngineeringSurface ScienceApplied PhysicsDefect FormationCu Void DefectChemical DepositionDefect ToleranceElectrical InsulationMicroelectronics
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