Journal of Applied Physics · 1984 · 23 citations · 2 references
Optical MaterialsOptical TechnologiesEngineeringElectron-beam LithographyDirect PhotoetchingLaser ApplicationsOptoelectronic DevicesBeam LithographyPhotodetectorsOptical PropertiesVarious ResistsPhotopolymer NetworkOptical SystemsPhotonicsOphthalmologyOptoelectronic MaterialsExcimer LasersOptoelectronics1-μM-thick FilmsApplied PhysicsOptical EngineeringExcimer Laser ProjectionOptical Devices
Direct photoetching of various resists and polymers with a 193-nm ArF excimer laser has been demonstrated by imaging a mask through a projection lens. Feature sizes ranging from 2 to 20 μm have been cleanly etched in 1-μm-thick films.
2
Direct high-resolution excimer laser photoetching
Stuart A. Rice, Kanti Jain · Applied Physics A · 1984 · 38 citations