Preparation of Al2O3 films by a new CVD process combining plasma and accelerated ion beams - Concepedia

Concepedia

Publication | Closed Access

Preparation of Al2O3 films by a new CVD process combining plasma and accelerated ion beams

10

Citations

3

References

1996

Year

Hiroshi Nakai, Hajime Kuwahara, Jōji Shinohara, Tatsumi Kawaratani, Tadashi Sassa, Yuji Ikegami

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms

Materials ScienceAluminium NitrideEngineeringApplied PhysicsAl2o3 FilmsAccelerated Ion BeamsNew Cvd ProcessPlasma ApplicationPlasma ProcessingChemical Vapor Deposition

References

	Year	Citations

Page 1