Determining the optimal contact length for a metal/multiwalled carbon nanotube interconnect

Abstract

A focused ion beam (FIB) is used to sequentially reduce the contact length of an evaporated metal film to a multiwalled carbon nanotube (MWCNT). By using this FIB contact cutback technique, the contact resistance between an individual MWCNT and evaporated thin films of Au, Au∕Ti, and Ag are accurately determined. The data permit a rational way to specify the minimum contact length of a metallic thin film to a MWCNT.