Low temperature metal-organic chemical vapor deposition of advanced barrier layers for the microelectronics industry

Chemical vapor deposition of titanium nitride at low temperatures

Sarah Kurtz, Roy G. Gordon · Thin Solid Films · 1986 · 221 citations

Natural Sciences, Materials Engineering, Materials Science +12

Chemical vapor deposition of titanium, zirconium, and hafnium nitride thin films

Renaud M. Fix, Roy G. Gordon, David M. Hoffman · Chemistry of Materials · 1991 · 217 citations

Natural Sciences, Chemistry, Materials Science +16

Synthesis of thin films by atmospheric pressure chemical vapor deposition using amido and imido titanium(IV) compounds as precursors

Renaud M. Fix, Roy G. Gordon, David M. Hoffman · Chemistry of Materials · 1990 · 177 citations

Natural Sciences, Chemistry, Materials Science +12

Low Temperature Deposition of Metal Nitrides by Thermal Decomposition of Organometallic Compounds

Kozoh Sugiyama, Sangryul Pac, Yasutaka Takahashi et al. · Journal of The Electrochemical Society · 1975 · 135 citations

Natural Sciences, Chemistry, Materials Science +14

Infrared Studies of the Surface and Gas Phase Reactions Leading to the Growth of Titanium Nitride Thin Films from Tetrakis(dimethylamido)titanium and Ammonia

Lawrence H. Dubois, Bernard R. Zegarski, Gregory S. Girolami · Journal of The Electrochemical Society · 1992 · 108 citations

Natural Sciences, Chemistry, Materials Science +17