Demonstration of quantized conductance in deeply reactive ion etched In0.53Ga0.47As/InP electron waveguides with in-plane gates

Jan-Olof J. Wesström, K. Hieke, Björn Stålnacke, Thomas Palm, Björn Stoltz

Applied Physics Letters · 1997 · 17 citations · 12 references

Concepts

Abstract

Clear conductance quantization at T=4.2 K has been demonstrated in a 140 nm wide and 200 nm long trench-isolated In0.53Ga0.47As/InP electron waveguide with in-plane gates, using the surrounding two-dimensional electron gas as the gate. It was fabricated using metalorganic vapor phase epitaxy, electron beam lithography, and CH4/H2 reactive ion etching. In a T=20 K measurement on a 60 nm wide and 100 nm long device, only the first conductance plateau of 2e2/h was reached.

References

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