Total dose hardening of SIMOX buried oxides for fully depleted devices in rad-tolerant applications

Abstract

A total dose hardening treatment is applied to SIMOX buried oxides. Total ionizing dose radiation testing is performed on fully-depleted transistors Fabricated on both hardened and non-hardened substrates. At 200 krads X-ray dose, the front gate shift is reduced from -0.7 to -0.2 V for FETs built on the hardened wafers.