Determination of the atomic nitrogen flux from a radio frequency plasma nitride source for molecular beam epitaxy systems

D. Voulot, R. W. McCullough, W. R. Thompson, D. Thorburn Burns, J Geddes, G. J. Cosimini, Erik Nelson, P. P. Chow, Jody J. Klaassen

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 28 citations · 5 references

Concepts

Abstract

Direct measurements of both the dissociation fraction and the atom flux have been carried out for the first time to characterize a radio frequency (rf) atomic nitrogen source. The measurements have been made over a range of source pressures and rf powers. Dissociation fractions of up to 0.4 and atomic nitrogen fluxes of up to 0.85×1018 atom s−1 were obtained. In addition these results have been correlated with spectroscopic measurements of the ratios of atomic and molecular optical emissions from the source plasma in order to provide a way of estimating in situ the atomic flux.

References

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