Deposition and properties of germanium-carbon alloy films produced from tetraethylgermanium in an r.f. discharge

Electronic properties of substitutionally doped amorphous Si and Ge

W. E. Spear, P. G. Le Comber · Philosophical magazine · 1976 · 715 citations

Natural Sciences, Materials Science, Physics +17

Electrical and optical properties of amorphous silicon carbide, silicon nitride and germanium carbide prepared by the glow discharge technique

David Anderson, W. E. Spear · Philosophical magazine · 1977 · 456 citations

Natural Sciences, Materials Science, Physics +17

Properties of glow-discharge deposited amorphous germanium and silicon

Robert C. Chittick · Journal of Non-Crystalline Solids · 1970 · 146 citations

Engineering, Materials Engineering, Materials Science +12

Preparation of highly photosensitive hydrogenated amorphous Si-Ge alloys using a triode plasma reactor

Akihisa Matsuda, Kiyoshi Yagii, Masato Koyama et al. · Applied Physics Letters · 1985 · 54 citations

Natural Sciences, Materials Engineering, Materials Science +17

Formation and properties of metallic organotin films

Erich Kny, L. L. Levenson, W. J. James et al. · Thin Solid Films · 1981 · 36 citations

Natural Sciences, Materials Engineering, Materials Science +12