Impact of size effects in local interconnects for future technology nodes: A study based on full-chip layouts

Abstract

In this paper, we investigate the impact of local interconnect size effects on the performance of integrated circuits (ICs) based on timing-closed GDSII-level layouts of circuit blocks with detailed routing. For this purpose, we create multiple standard cell and interconnect libraries for 45-, 22-, 11- and 7-nm technology nodes considering scaling trends projected by the International Technology Roadmap for Semiconductors (ITRS) and assuming various sets of size effect parameters. We make comparisons between the performances of circuit designs that are implemented using these libraries.