Field ion microscope examination of heavy ion radiation damage in iridium II. analysis of vacancy distributions

Abstract

Abstract Two methods are described for determining the distribution of point defects in field ion microscope specimens from a series of micrographs. Both methods assume the micrographs to be orthographic projections of the specimen surface; the first is a manual method and the second uses a digitizer and computer. Examples are given of vacancy distributions in specimens bombarded with heavy ions at (a) 78°k and (b) room temperature.