Doped In-Ge-Te Phase Change Memory Featuring Stable Operation and Good Data Retention

Takahiro Morikawa, Hirokazu Moriya, Tomio Iwasaki, M. Matsuoka, F. Nitta, Masahiro Moniwa, Tomohiro Koga, N. Takaura, Kenzo Kurotsuchi, M. Kinoshita,

2007 · 39 citations · 0 references

Concepts

Abstract

We have fabricated a phase change memory using doped In-Ge-Te to improve the data retention required for industrial and automotive use. This chalcogenide features higher thermal stability as well as denser texture and improved adhesion. The memory cell using doped In-Ge-Te provided a larger read margin and better data retention than conventional Ge <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> Sb <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> Tes, and we demonstrated 10-year retention at temperatures above 150degC, which is the highest temperature ever reported.