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Total reflection X-ray fluorescence spectrometry: matrix removal procedures for trace analysis of high-purity silicon, quartz and sulphuric acid

Chemical EngineeringX-ray SpectroscopyEngineeringAnalytical InstrumentationSulphuric AcidSpectroscopyNatural SciencesMass SpectrometryX-ray DiffractionHigh-purity SiliconAnalytical ChemistryMatrix Removal ProceduresChemistryElemental CharacterizationX-ray Fluorescence