Aerosol formation by rapid nucleation during the preparation of SiO2 thin films from SiCl4 and O2 gases by CVD process

Kikuo Okuyama, David D. Huang, John H. Seinfeld, Naoyuki Tani, Yasuo Kousaka

Chemical Engineering Science · 1991 · 23 citations · 16 references

Concepts

References

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