Publication | Closed Access
Highly conformal atomic layer deposition of tantalum oxide using alkylamide precursors
63
Citations
9
References
2003
Year
Materials ScienceMaterial AnalysisEngineeringOxide ElectronicsSurface ScienceApplied PhysicsAlkylamide PrecursorsChemistryChemical DepositionLayered MaterialChemical Vapor Deposition
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