Highly conformal atomic layer deposition of tantalum oxide using alkylamide precursors

Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications

C. Chaneliere, Jean‐Luc Autran, R. A. B. Devine et al. · Materials Science and Engineering R Reports · 1998 · 676 citations

Natural Sciences, Materials Engineering, Materials Science +14

Atomic Layer Epitaxy Growth of Tantalum Oxide Thin Films from Ta (  OC 2 H 5 ) 5 and  H 2 O

Kaupo Kukli, Mikko Ritala, Markku Leskelä · Journal of The Electrochemical Society · 1995 · 125 citations

Natural Sciences, Materials Engineering, Materials Science +17

Metallo-organic compounds containing metal–nitrogen bonds. Part VI. Infrared and nuclear magnetic resonance of dialkylamidoderivatives of titanium, vanadium, zirconium, niobium, hafnium, tantalum, and thorium

D. C. Bradley, M. H. Gitlitz · Journal of the Chemical Society A Inorganic Physical Theoretical · 1969 · 108 citations

Natural Sciences, Chemistry, Materials Science +16

Characterization of surface exchange reactions used to grow compound films

M. Pessa, Reijo Mäkelä, Tuomo Suntola · Applied Physics Letters · 1981 · 99 citations

Natural Sciences, Materials Engineering, Materials Science +17

Atomic Layer Deposition and Chemical Vapor Deposition of Tantalum Oxide by Successive and Simultaneous Pulsing of Tantalum Ethoxide and Tantalum Chloride

Kaupo Kukli, Mikko Ritala, Markku Leskelä · Chemistry of Materials · 2000 · 61 citations

Natural Sciences, Materials Engineering, Materials Science +14