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Unipolar resistive switching behavior of amorphous gallium oxide thin films for nonvolatile memory applications
111
Citations
23
References
2015
Year
Materials ScienceMaterials EngineeringElectrical EngineeringNon-volatile MemoryEngineeringOxide ElectronicsSurface ScienceApplied PhysicsResistive Switching BehaviorNonvolatile Memory ApplicationsGallium OxideAmorphous GalliumSemiconductor MaterialSemiconductor MemoryThin FilmsPhase Change MemoryThin Film Processing
Amorphous gallium oxide thin film with heavy oxygen deficiency was deposited on Pt/Ti/SiO2/Si substrate by pulsed laser deposition in order to explore the resistive switching behavior of the Pt/Ga2O3-x/Pt sandwich structure. A well unipolar resistive switching behavior was obtained in this structure, which exhibits a high resistance ratio of OFF/ON up to 104, non-overlapping switching voltages, and excellent repeatability and retention. Both I-V relation plots of ON and OFF states and temperature dependent variation resistances indicate that the observed resistive switching behavior can be explained by the formation/rupture of conductive filaments formed out of oxygen vacancies.
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