Electromigration and diffusion in thin films: A new technique

Abstract

A new technique has been realized for studying metal migration induced by an electric field in thin metallic stripes. The same experiment allows one to determine the diffusion coefficient, the drift mobility, and the effective charge in the same conditions. A sectioning technique and radiotracers are used. Due to the high sensitivity, the data can be obtained down to the temperatures which are of practical interest for the electronic components.