Journal of Comparative and Physiological Psychology · 1977 · 96 citations · 19 references
No abstract for EP 1381710\nAbstract looks like WO 02083979\n \nIn a process and device for depositing an at least partially crystalline silicon layer a plasma is generated and a substrate (24) is exposed under the influence of the plasma to a silicon-containing source fluid for deposition of silicon therefrom. A pressure drop is applied between a location (12) where the source fluid is supplied and the substrate (24). In addition to the source fluid an auxiliary fluid is also injected which is able to etch non-crystalline silicon atoms. The substrate (24) is exposed to both the source fluid and the auxiliary fluid.
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The open-field test: A critical review.
Roger Walsh, Robert A. Cummins · Psychological Bulletin · 1976 · 2.3K citations