Design and scale-up of chemical vapour deposition reactors for semiconductor processing

Numerical Heat Transfer and Fluid Flow

Chia‐Jung Hsu · Nuclear Science and Engineering · 1981 · 15.2K citations

Heat Transfer Process, Engineering, Nuclear Engineering +12

A Stagnant Layer Model for the Epitaxial Growth of Silicon from Silane in a Horizontal Reactor

F. C. Eversteyn, P. J. Severin, C. H. J. v. d. Brekel et al. · Journal of The Electrochemical Society · 1970 · 273 citations

Epitaxial Growth, Engineering, Physics +12

A Mathematical Model of the Fluid Mechanics and Gas‐Phase Chemistry in a Rotating Disk Chemical Vapor Deposition Reactor

Michael E. Coltrin, Robert J. Kee, Greg H. Evans · Journal of The Electrochemical Society · 1989 · 236 citations

Engineering, Fluid Mechanics, Reactor Physics +17

CVD in Stagnation Point Flow: An Evaluation of the Classical 1D Treatment

Carl J. Houtman, David B. Graves, Klavs F. Jensen · Journal of The Electrochemical Society · 1986 · 132 citations

Engineering, Fluid Mechanics, Mechanical Engineering +20

A Mathematical Model of the Hydrodynamics and Gas‐Phase Reactions in Silicon LPCVD in a Single‐Wafer Reactor

Chris R. Kleijn · Journal of The Electrochemical Society · 1991 · 96 citations

Chemical Engineering, Wafer Scale Processing, Engineering +13