Gas dynamics and film profiles in pulsed-laser deposition of materials

Abstract

Film-thickness profiles obtained in pulsed-laser deposition are calculated by using the well-known solution of the gas-dynamic equations which describes the expansion of the plasma plume in vacuum. The time for plasma formation is supposed to be short compared with the time of expansion. The film profile depends on the initial dimensions of the plume and on the adiabatic exponent of the vapor.