Concepedia

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Range profiles of 10 to 390 keV ions (29 ≦ Z1 ≦ 83) implanted into amorphous silicon

DOI

37

Citations

13

References

1987

Year

P.F.P. Fichtner, M. Behar, C. A. Olivieri, R. Livi, J. P. de Souza, F.C. Zawislak, J.P. Biersack, D. Fink
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms

References

YearCitations

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