Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography - Concepedia

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Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography

10

Citations

0

References

2000

Year

A.J. van Dodewaard, Wilhelmus S. M. M. Ketelaars, R.F.M. Roes, J.A.J. Kwinten, F.C.M.J.M. van Delft, Arnold J. van Run, A. K. van Langen-Suurling, J. Romijn

Microelectronic Engineering

Materials ScienceEngineeringElectron-beam LithographyPhysicsBeam LithographyNanoelectronicsOptical PropertiesApplied PhysicsE-beam LithographyMicroelectronicsOptoelectronicsNanolithography Method

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