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Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing

DOI

16

Citations

10

References

2003

Year

U. Kleineberg, Th. Westerwalbesloh, Wiebke Hachmann, U. Heinzmann, J. Tümmler, Frank Scholze, G. Ulm, S. Müllender
Thin Solid Films

References

YearCitations

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