Simulation of deposition-topography granular distortion for TCAD

Abstract

A new deposition simulator for technology computer aided design (TCAD) is presented in this paper. The solution, on a cellular automaton lattice, of the equations that describe the deposition process has enabled the proposed simulator to handle the complicated boundary and initial conditions imposed by granular defects. This simulator can provide scanning electron microscope (SEM)-like cross-sectional views that are in very good agreement with experimental and simulation results found in the literature, and it can also be used to perform numerical experiments. The effects of granule temperature, location, and size on the deposition profiles have been studied by performing numerical experiments using this simulator.