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Grain boundary potential determination in polycrystalline silicon by the scanning light spot technique
37
Citations
9
References
1981
Year
EngineeringMicroscopySilicon On InsulatorElectron MicroscopyOptical PropertiesLargest PotentialsMaterials ScienceCrystalline DefectsPhysicsMicroanalysisPhotoelectric MeasurementSemiconductor Device FabricationMicroelectronicsMicrostructureSilicon DebuggingLight Spot TechniqueApplied PhysicsCondensed Matter PhysicsPolycrystalline SiliconSmallest-angle Grain BoundariesOptoelectronics
Local grain boundary potential has been determined by scanning light spot technique. Photocurrent peaks vary from boundary to boundary giving a strong peak for large-angle grain boundaries and becoming negligible for the smallest-angle grain boundaries observed. The largest potentials had typical values of around 0.3 eV and the corresponding interface state densities were in the 1013 cm−2 range.
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