Fabricating high-aspect-ratio sub-diffraction-limit structures on silicon with two-photon photopolymerization and reactive ion etching

Two-photon polymerization initiators for three-dimensional optical data storage and microfabrication

B. H. Cumpston, S. P. Ananthavel, Stephen Barlow et al. · Nature · 1999 · 2.2K citations

Natural Sciences, Materials Engineering, Materials Science +14

Three-dimensional microfabrication with two-photon-absorbed photopolymerization

Shoji Maruo, Osamu Nakamura, Satoshi Kawata · Optics Letters · 1997 · 1.9K citations

Engineering, Materials Engineering, Materials Science +16

The black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control

Henri Jansen, M. de Boer, R. Legtenberg · Journal of Micromechanics and Microengineering · 1995 · 593 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Femtosecond laser-induced two-photon polymerization of inorganic–organic hybrid materials for applications in photonics

Jesper Serbin, A. Egbert, Andreas Ostendorf et al. · Optics Letters · 2003 · 587 citations

Natural Sciences, Materials Engineering, Materials Science +15

High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS

H. Lorenz, M. Despont, N. Fahrni et al. · Sensors and Actuators A Physical · 1998 · 573 citations · Full text

Engineering, Materials Engineering, Materials Science +12