Publication | Open Access
Far-infrared transmission in GaN, AlN, and AlGaN thin films grown by molecular beam epitaxy
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Citations
23
References
2008
Year
Materials ScienceAluminium NitrideWide-bandgap SemiconductorEngineeringPhysicsOptical PropertiesApplied PhysicsSemiconductor NanostructuresAluminum Gallium NitrideCubic GanInfrared TransmissionAlgan Thin FilmsGan Power DeviceThin FilmsMolecular Beam EpitaxyFar-infrared TransmissionOptoelectronicsFar-infrared Transmission Study
We present a far-infrared transmission study on group-III nitride thin films. Cubic GaN and AlN layers and c-oriented wurtzite GaN, AlN, and AlxGa1−xN (x<0.3) layers were grown by molecular beam epitaxy on GaAs and Si(111) substrates, respectively. The Berreman effect allows us to observe simultaneously the transverse optic and the longitudinal optic phonons of both the cubic and the hexagonal films as transmission minima in the infrared spectra acquired with obliquely incident radiation. We discuss our results in terms of the relevant electromagnetic theory of infrared transmission in cubic and wurtzite thin films. We compare the infrared results with visible Raman-scattering measurements. In the case of films with low scattering volumes and/or low Raman efficiencies and also when the Raman signal of the substrate material obscures the weaker peaks from the nitride films, we find that the Berreman technique is particularly useful to complement Raman spectroscopy.
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