Publication | Closed Access
Step bunching of vicinal GaN(0001) surfaces during molecular beam epitaxy
31
Citations
14
References
2000
Year
Materials ScienceWide-bandgap SemiconductorEpitaxial GrowthEngineeringPhysicsNanoelectronicsSurface ScienceApplied PhysicsAluminum Gallium NitrideGan Power DeviceVicinal GanStep BunchingMolecular Beam EpitaxyMicroelectronicsCategoryiii-v Semiconductor
Step bunching of vicinal GaN(0001) surface during epitaxial growth is observed by scanning tunneling microscopy. Large step stiffness and repulsive step-step interaction are suggested based on step morphology observations. The size of the bunch changes with time, depending on the direction in which the substrate is heated by a direct current. This observation provides evidence for the electromigration effect causing the step bunching, and from the field dependence we infer that adatoms, which are likely N, have effective positive charges.
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