Pressure‐Assisted Capillary Force Lithography

Abstract

Pressure‐assisted capillary force lithography is introduced using a permeable fluoropolymer material as a mold. Slight pressing (∼ 2–3 bar), when combined with a newly developed experimental set‐up, ensures conformal contact between the stiff fluoropolymer mold and the substrate. The stiff nature of the mold material makes it possible to pattern sub‐100 nm features (see Figure and cover).